Laser-beam, pattern drawing/inspecting apparatus

摘要

A laser-beam, pattern drawing/inspecting apparatus comprises a reciprocating stage for supporting a printed substrate having an etchant-resistant resist layer coated on it, a laser-beam scanning device having a laser for selectively emitting a first laser beam and a second laser beam less intense than the first laser beam, and an optical system for guiding the first and second laser beams to the printed substrate along the same optical path, the first laser beam scanning the resist layer to draw a pattern thereon, and the second laser beam scanning the resist layer, and a pattern inspection device for receiving the second laser beam reflected from the resist layer, thereby to optically inspect the pattern drawn on the resist layer.