发明名称 POLYSILANE AND PHOTO-SENSITIVE COMPOSITION
摘要 PURPOSE:To provide a novel polysilane composed of a (co)polymer containing a specific constituent unit, soluble in a polar solvent such as methanol, acetone and water and useful for a photo-sensitive composition developable with an alkali and capable of forming a fine pattern. CONSTITUTION:The objective silane is composed of a (co)polymer having constituent unit of formula [R1 and R2 are (un)substituted aromatic group of (un) substituted alkyl]. The silane can be produced by mixing (A) a dichlorosilane having a alcohol or phenol group protected with trimethylsilyl group with (B) a sodium dispersion in toluene at 100-120 deg.C, filtering the reaction product, adding (C) methanol to the filtrate to effect hydrolysis, subjecting the product to concentration and fractional precipitation to obtain a polysilane, reacting the polysilane with (D) an amine in (E) THF, precipitating the reaction product in an HCl solution, producing a polymer by fractional precipitation and drying the obtained polymer.
申请公布号 JPS6456732(A) 申请公布日期 1989.03.03
申请号 JP19870244341 申请日期 1987.09.30
申请人 TOSHIBA CORP 发明人 HORIGUCHI RUMIKO;HAYASE SHUJI;ONISHI KIYONOBU;GOKOCHI TORU
分类号 G03C1/72;C08G77/00;C08G77/02;C08G77/48;C08G77/60;C08L83/16;G03C1/00;G03C1/675;G03F7/039;G03F7/075;G03F7/11;H01L21/027;H01L21/30 主分类号 G03C1/72
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