发明名称 |
MICROWAVE PLASMA CVD DEVICE HAVING IMPROVED MICROWAVE INTRODUCING WINDOW |
摘要 |
PURPOSE:To perform formation of a deposited film continuously and stably by constituting a microwave introducing window of alpha-alumina contg. specified amount of a vitreous component in a microwave plasma CVD device. CONSTITUTION:The inside of a reaction vessel 101 is vacuumized and exhausted via an exhaust pipe 104 and a base body 105 is heated and held at prescribed temp. with a built-in heater and a gaseous raw material is introduced through a gas introducing pipe 108 and the inside of the reaction vessel is maintained at about <=1X10<-2>Torr degree of vacuum. Then a deposited film is formed on the electrically-conductive base body 105 by introducing microwave into a discharge space 106 via a waveguide 103 and a microwave introducing window 102. At this time, the introducing window 102 is constituted of alumina ceramics in which 1-10% vitreous component such as SiO2, CaO and MgO is incorporated and the other components substantially are alpha-alumina. Thereby the introducing window 102 excellent in durability and transmission efficiency is obtained and a deposited film is formed continuously and stably. |
申请公布号 |
JPS6456873(A) |
申请公布日期 |
1989.03.03 |
申请号 |
JP19880057296 |
申请日期 |
1988.03.10 |
申请人 |
CANON INC |
发明人 |
IIDA SHIGEHIRA;ARAI TAKASHI;HASHIZUME JUNICHIRO;TAKEI TETSUYA;SAITO KEISHI |
分类号 |
C23C16/44;C23C16/50;C23C16/511;G03G5/08;H01L21/205;H01L31/04 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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