发明名称 CHROMIUM PLATING SOLUTION
摘要 PURPOSE:To obtain a Cr plating soln. enabling deposition to a large thickness and forming plating having satisfactory corrosion resistance by incorporating hexavalent and tervalent Cr ions, an org. acid and iodic acid or iodate. CONSTITUTION:An aq. soln. contg. about 100-1,000g/l chromic acid, about 50-1,000g/l org. acid and about 2-10g/l iodic acid or iodate is adjusted to about 1.5-3.0pH with sulfuric acid or an aq. ammonia soln. to obtain a Cr plating soln. The reduction of Cr in the plating soln. is accelerated by both the org. acid and iodic acid, rapid plating proceeds and thick plating having satisfactory corrosion resistance is obtd. The hardness of the resulting plating is increased by heat treatment.
申请公布号 JPS6455388(A) 申请公布日期 1989.03.02
申请号 JP19870213763 申请日期 1987.08.26
申请人 SHIMADZU CORP 发明人 KOJIMA KAYOKO
分类号 C23C18/31 主分类号 C23C18/31
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