发明名称 FORMATION OF THIN FILM
摘要 PURPOSE:To easily form a thin film on a substrate by providing a compd. contg. a metal in the structure to the surface of the substrate and by decomposing the compd. by irradiation with active radiation. CONSTITUTION:A compd. contg. a metal in the structure, e.g., indium 2- ethylhexanoate or cadmium mercaptide is provided to the surface of a substrate. In order to provide the compd., the compd. may be dissolved or dispersed in a solvent and applied or may be directly put on the substrate. The compd. on the substrate is then decomposed by irradiation with active radiation such as electric waves, IR, UV or X-rays to uniformly form a thin film of indium oxide, cadmium sulfide, etc., on the substrate. The metal-contg. thin film can be patterned by masking the substrate before the irradiation.
申请公布号 JPS6455385(A) 申请公布日期 1989.03.02
申请号 JP19870210499 申请日期 1987.08.25
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 ISOZAKI YASUTO;OKANO KAZUYUKI;HASEGAWA HIROSHI;TABATA MUNEHIRO;NIKI CHIHARU
分类号 C01B13/14;C23C18/14 主分类号 C01B13/14
代理机构 代理人
主权项
地址