发明名称 PHOTOLYTHOGRAPHIC PROCESS FOR THICK FILM PASTE DEPOSITED ON A SUBSTRATE
摘要 The invention relates to electric circuits formed by depositing a thick layer of conductive, resistive or dielectric paste on a flat substrate. The thick layers are deposited using a squeegee or by silk screen printing. In this first case, the resolution of the patterns is at best 200 microns, limited by the mesh of the silk screen printing screens. For obtaining finer patterns, the thick layer is dried, then masted using a photoresist, whose patterns may have a resolution of 50 microns, with a space of 50 microns. The thick layer is then etched, in its parts not protected by the photoresist mask, using a mixture of organic solvents which have a differential solubility with respect to the thick layer and to the photoresist.
申请公布号 DE3567990(D1) 申请公布日期 1989.03.02
申请号 DE19853567990 申请日期 1985.12.04
申请人 THOMSON-CSF 发明人 DUFOUR, MICHEL
分类号 G03F7/09;H05K1/09;H05K3/06;H05K3/12;(IPC1-7):H01L21/70 主分类号 G03F7/09
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