| 摘要 |
PURPOSE:To improve deposition resistance and workability and also to reduce contact resistance, by dispersing respectively prescribed percentages of internally oxidized grains formed by dispersing SnO2, CdO, etc., into Ag and high m.p. conductive grains of W, Mo, etc., into a cast structure. CONSTITUTION:This electric contact material is formed of a casting in which respective spaces among internally oxidized grains and high m.p. conductive grains are filled with matrix metal. The above internally oxidized grains are formed by dispersing one or more oxides among SnO2, CdO, In2O3 and ZnO into Ag. Further, the high m.p. conductive grains are selected from those of W, Mo, Ni, WC, TiB, and graphite. Moreover, the above-mentioned oxide grains and high m.p. conductive grains are contained by 1-40wt.%, in total, based on the casting. |
