| 摘要 |
<p>A gas separation film comprising a permselective layer which is formed by reaction in situ of a Schiff base metal complex compound represented by the following formula (I) <CHEM> wherein rings A and B each represent an o-phenylene or o-naphthylene group which may be substituted by at least one group selected from the class consisting of halogen atoms and groups of the formula -X-R in which R represents a saturated or unsaturated aliphatic hydrocarbon group having not more than 22 carbon atoms and X represents a direct bond or a binding member between R and ring A or B, selected from the class consisting of -O-, -COO-, -NHCO- and -S-, Ro represents a hydrocarbon group having not more than 6 carbon atoms in which adjacent carbon atoms or adjacent carbon atoms via one carbon atom are bound to bonds a and b, and M represents a metal selected from the group consisting of Fe, Co, Cu, Ni, Mn, Cr and Zn, with a polymeric ligand.</p> |
