| 摘要 |
PURPOSE:To contrive mass production by forming >=2 pieces of film-shaped electrodes respectively having sensitive parts which constitute prescribed area ratios with each other on the surface of an insulating base plate and covering the electrodes except the sensitive parts with an insulating protective film by photolithography. CONSTITUTION:Block lines are formed on the surface of an alumina ceramics plate and after the working electrodes 3 and reference electrodes 4 are simultaneously formed by sputtering, etc., in each of the blocks, a photosensitive polyimide film 5 is simultaneously formed by photolithography in each of the blocks. The plate is then divided by the block lines to form individual insulating substrates 2. Leads 7 are connected to junctures 3b, 4b. The leads 7 are connected to a DC power supply and the substrate 2 is immersed in 0.1-1.0N hydrochloride acid. A voltage is then applied to the electrode 3 as negative and the electrode 4 to positive to form a silver chloride film 8 on the sensitive part 4a of the reference electrode; thereafter, the substrate is cleaned with distilled water and the electrode is completed. |
