| 摘要 |
PURPOSE:To obtain the titled resist having the high oxygen plasma durability, resolution and sensitivity against UV by incorporating a specified polysiloxane in the titled resist. CONSTITUTION:The titled resist contains the polysiloxane shown by formula I wherein R1-R3 are each methyl or phenyl group, R4-R8 are each hydrogen atom or methyl group, at least one of the groups R4-R8 is methyl group, (n) is a positive integer, (m) is 0 or a positive integer. And, a bisazide compd. is preferably incorporated in the polysiloxane. Thus, the titled resist with the high oxygen plasma durability, resolution and the good sensitivity against UV, is obtd. |
