发明名称 PROJECTION FORMATION
摘要 PURPOSE:To form a projection of an optional shape, by a method wherein the surface of a solid matter in which gas molecules are absorbed is irradiated with an electron beam. CONSTITUTION:The electron gun 1 of a transmission electron microscope is used as the source of an electron beam. This electron microscope has been reconstructed so that WF6 gas 20 can be introduced into the part in the vicinity of the sample 10 which is placed between magnetic poles 50 located in a sample chamber 40. As the electron beams to be used to obtain the image of the electron microscope, performs an additional function as an excitation beam, the position where W will be deposited by decomposing WF6 and the shape of the deposit can be confirmed simultaneously by the fluorescent plate provided in a camera chamber 30. The microscopic pattern 13 of W can be formed by scanning the electron beam on the surface of the Si substrate while the WF6 gas, for example, of the pressure of 1X10<-6>Torr is being fed. Said pattern 13 is practically used for a quantum fine wire, a grating, a light absorber and the like.
申请公布号 JPS6453410(A) 申请公布日期 1989.03.01
申请号 JP19870210997 申请日期 1987.08.24
申请人 NEC CORP 发明人 ICHIHASHI TOSHIYA;MATSUI SHINJI
分类号 H01L21/205;C23C16/48;H01L21/203;H01L21/283;H01L21/285;H01L21/3205;H01L29/06 主分类号 H01L21/205
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