发明名称 |
HORIZONTAL FURNACE APPARATUS |
摘要 |
A horizontal furnace for processing semiconductor devices having a suspension cantilever which supports workpieces in the furnace tube to achieve particle or dust-free operation while still allowing the loading and unloading of workpieces to be heat-treated. The furnace tube consists of a heating chamber, a connecting chamber and a supporting chamber vertically connected to each other. The chambers correspond to an accommodating portion, a connecting portion and a supporting portion of the cantilever. The supporting chamber is kept at lower temperature than that of the heating chamber during heat processing to prevent deformation or creeping of the suspension cantilever. |
申请公布号 |
DE3567769(D1) |
申请公布日期 |
1989.02.23 |
申请号 |
DE19853567769 |
申请日期 |
1985.05.09 |
申请人 |
FUJITSU LIMITED |
发明人 |
SAKURAI, JUNJI C/O FUJITSU LIMITED |
分类号 |
H01L21/205;H01L21/22;H01L21/31;H01L21/677;H01L51/00;(IPC1-7):H01L21/324;H01L21/68 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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