首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
METHOD FOR FORMING POSITIVE RESIST PATTERN
摘要
申请公布号
JPS6449039(A)
申请公布日期
1989.02.23
申请号
JP19870205155
申请日期
1987.08.20
申请人
TOSOH CORP
发明人
TSUTSUMI YOSHITAKA;KIYOTA TORU;MATSUMURA KOUZABUROU;NAGAOKA TSUNEKO;YANAGIHARA TOSHIMITSU
分类号
G03F7/039
主分类号
G03F7/039
代理机构
代理人
主权项
地址
您可能感兴趣的专利
Adaptive brake force setting system in an optical recording device
Perpendicular magnetic recording medium and magnetic recording/reproduction apparatus
Methods for sterilizing biological materials by irradiation over a temperature gradient
Compact platform for manufacturing coarse wavelength division multiplexing optical components
Transfer set assembly for multiple lumen catheters
Wireless community alerting system
Optical catheter with double-clad fiber
Process for producing 1,1,1-trifluoroacetone
Hollow polymer particle, process for producing the same, paper coating composition using the same, coated paper and process for producing the same
Polycarbonate composition having excellent releasability from mold
Surface-active photoinitiators
Composition containing an iron complexing protein and a precursor of nitrogen monoxide metabolism and/or a chemical donor of nitrogen monoxide and uses thereof
Method and device for producing a bitumen-bonded construction material mixture
Remote programming of serialized semiconductor devices using web or internet protocols
Integrated method for production of carrageenan and liquid fertiliser from fresh seaweeds
Active night vision system for vehicles employing anti-blinding scheme
Seamless digital channel changing
Diuretic or sulphonylurea for use in antiviral treatment
Secreted and transmembrane polypeptides and nucleic acids encoding the same
Bisphenylene-spirobifluorene compounds, method for synthesizing the same, and electroluminescence material and device having the same
