CYCLIC OR BICYCLIC ALUMINIUM, GALLIUM OR INDIUM ORGANIC COMPOUNDS AND THEIR USE FOR VAPOUR DEPOSITION OF METALS ON SUBSTRATES

摘要

The invention concerns organometallic compounds which are intramolecularly stabilized and have a cyclic or bicyclic structure and their use for manufacturing thin films and epitaxial layers by vapour deposition. The organometallic compounds have the formula (I), where M = Al, In or Ga; Y = N, P, As or Sb and the symbols R<1>, R<2>, M, N and o have the meaning given in claim 1.