发明名称 VAPOR DEPOSITION METHOD WITH LASER
摘要 PURPOSE:To form a film having a desired compsn. and a desired thickness by combining plural evaporating sources in a column shape to form an evaporating source and by projecting laser beams on the source while rotating the source at a prescribed peripheral speed. CONSTITUTION:An evaporating source 2 is divided into every desired components or every group of plural desired components and the divided evaporating sources 2a, 2b, 2c are combined in a direction parallel to their axes to form an integrated evaporating source 2 in a column shape. The source 2 is rotated on its axis at a prescribed peripheral speed. Laser beams from a laser beam generating source are reflected by a mirror 7 and projected on the rotating source 2. The surfaces of the sources 2a-2c are separately evaporated and fine particle deposit together on the surface of a substrate 3. Thus, a film of a ceramic superconductive material, carbonitride, etc., can be effectively formed.
申请公布号 JPS6447858(A) 申请公布日期 1989.02.22
申请号 JP19870201946 申请日期 1987.08.14
申请人 TOKAI UNIV;NKK CORP 发明人 TACHIKAWA KYOJI;NAKADA KIYOKAZU;KOSUGE SHIGECHIKA;ONO MORIAKI;WATANABE ITARU
分类号 H01B12/06;C23C14/28;H01B13/00;H01L39/24 主分类号 H01B12/06
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