| 摘要 |
PURPOSE:To easily detect the abnormal state on the surface of a target while keeping a high vacuum by using a camera to photograph the target surface illuminated by an illuminating jig in a sputtering chamber. CONSTITUTION:The light source 6 as the illuminating jig and a mini-camera 3 as the camera device fixed to a variable stage 4 are provided in the sputtering chamber 1. In the sputtering device, the surface of the target 2 is illuminated by the light source 6 while keeping the inside of the chamber 1 at a high vacuum. The illuminated surface of the target 2 is photographed by the mini-camera 3. The photographed image is enlarged and observed, and the abnormal state on the surface is detected. Any trouble in the sputtering device can be easily found at an early stage by this method. |
