摘要 |
<p>This invention is concerned with the fabrication of flat panel display devices wherein a film of large crystal polysilicon is grown on a substrate. More particularly, the present invention is drawn to such devices wherein the substrate is prepared from a strontium aluminosilicate glass consisting essentially, in mole percent, of about 9-12% SrO, 9-12% Al2O3, and 7782% SiO2.</p> |