发明名称
摘要 PURPOSE:To prepare the titled PVA derivative having high photo-sensitivity even at a low content of the photo-sensitive functional group, and suitable as a photoresist, etc., by reacting a (partially) saponified polyvinyl acetate with an aldehyde or its acetal derivative. CONSTITUTION:The objective derivative having the structure substituted with the unit of formula II, is prepared by reacting (A) a (partially) saponified saponified polyvinyl acetate (pref. having a saponification degree of >=70% and an average polymerization degree of 200-3,000) with (B) the aldehyde of formulaI(A is polymethylene which may have side chain) or its acetal derivative[e.g. 2-(p- formylbenzylidene)cyclopentanone], in water or a hydrous organic solvent, in the presence of an acid catalyst (pref. hydrochloric acid.).
申请公布号 JPS5910721(B2) 申请公布日期 1984.03.10
申请号 JP19800175659 申请日期 1980.12.12
申请人 KOGYO GIJUTSUIN 发明人 NAKANISHI HACHIRO;ICHIMURA KUNIHIRO;FUJISHIGE NORINAGA;KATO MASAO
分类号 C08F8/00;C08F8/28;C08F16/00;C08F16/02;G03C7/10;G03F7/038;H01L21/027;H01L21/302;H05K3/00;H05K3/06 主分类号 C08F8/00
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