| 摘要 |
Compounds of formula I <IMAGE> (I) in conjunction with compounds that donate acid when exposed to actinic radiation, are suitable for use as positive photoresists. In formula I, R1 and R2 are hydrogen, alkyl, aryl, cycloalkyl, aralkyl or alkaryl, R3 to R8 are hydrogen or lower alkyl, X is -O- or -NR9-, where R9 is hydrogen or C1-C4alkyl n is 0 or 1, m is 2, 3 or 4 and Q is an organic radical of valency m. The photoresists are suitable for making printing formes, printed circuits, integrated circuits or silver-free photographic films.
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