| 摘要 |
PURPOSE:To improve the reliability and yield of products and to improve the throughput of a manufacturing line by providing a data storage part for filing various parameters, and an operation input unit for automatically setting an optimum parameter by designating a file name corresponding to the surface state of a sample at the time of inspecting. CONSTITUTION:Optimum illuminating conditions corresponding to the surface state of a wafer, i.e., a surface material and surface shape, etc., are field in the format of parameters for forming the conditions in a data storage part 14, an optimum file for the surface state of the wafer to be inspected is drawn from an operation input unit 16 at the time of inspecting, and an electron beam is scanned by the optimum parameter in the film. Thus, the optimum inspection is rapidly performed. As a result, the reliability and yield of a semiconductor device are improved, and the throughput of a manufacturing line of the device is improved. |
