| 摘要 |
PURPOSE:To obtain a device for developing a photoresist which can improve uniformity and reproducibility of development in a wafer by providing a rinsing solution temperature control means in a rinsing solution supply means. CONSTITUTION:After a wafer 3 is coated with developer 4 while rotating the wafer 3 on a chuck 2 to be developed for a designated time, the developer 4 is replaced by a rinsing solution 6 to rinse it, thereby finishing the develop ment. The temperature of the developer 4 and the temperature of environment as well as the temperature of the solution 6 are controlled by temperature control means 7. The temperature of the solution 6 is made to approach the temperature of the developer 4 without reducing from the temperature of the developer 4 and maintained constantly. Thus, an unstable factor due to the irregular temperature of the solution 6 is eliminated. In this manner, a develop ing device in which the developing uniformity in a wafer and the reproducibility between wafers and lots can be improved is obtained. |
