| 摘要 |
PURPOSE:To make it possible to form a thin film with separated to superconductive and non-superconductive regions without damage by selectively reducing an oxide superconductive thin film formed on a substrate, and conducting only heat treatment. CONSTITUTION:Yb, Ba, Cu, and O film 1 is made to be accumulated on a substrate 2 by electron beam evaporation. Then a substance 3 having a high reduction property such as Cu etc., is deposited and patterned by. BY applying heat treatment to the substance 3, the lower part of Cu becomes a non- superconductive region 4 because O2 couples with Cu to escape from a thin film, and a part not contacted to Cu becomes a superconductive region 5. When finally Cu is removed, a suitable wiring layer for semiconductor element can be obtained. This makes it possible to form the thin film having the non- superconductive region and the superconductive region without process giving damage to a substrate or the thin film of etc. |
