发明名称 Electroless gold plating solution
摘要 An electroless gold plating solution comprising a thiosulfato gold(I) complex, a thiosulfate, thiourea, a pH regulator and a stabilizer. The electroless gold plating solution shows a plating rate and a plating solution stability comparable to those of conventional gold plating solutions containing cyanide ions, and requires a smaller amount of reducing agent to be used therein. Further, the electroless gold plating solution is safe because it does not contain cyanide ions.
申请公布号 US4804559(A) 申请公布日期 1989.02.14
申请号 US19870091457 申请日期 1987.08.31
申请人 HITACHI, LTD. 发明人 USHIO, JIRO;MIYAZAWA, OSAMU;YOKONO, HITOSHI;TOMIZAWA, AKIRA
分类号 C23C18/44;(IPC1-7):C23C3/02 主分类号 C23C18/44
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