| 摘要 |
In ion beam etching, the substrates are moved in the vacuum chamber on holding devices. These holders are fitted in groups onto a turntable and turn additionally about their own axis (planetary movement). The substrate holder comprises a square or cylindrical basic body with a threaded pin. On the top surface of this basic body, the substrate is held by at least three holding fingers, which are moved by a rotatable lifting ring for loading and unloading. The advantages are dissipation of the heat introduced into the substrate, simple, quick and reliable fastening of the substrate, loading and unloading without contamination and optimum coverage in the etching chamber. The field of application is that of thin-film magnetic heads. <IMAGE>
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