| 摘要 |
The gas-treating device comprises a closed liquid circuit comprised of a liquid chamber (1), ejector venturi fittings (10-11), pipes (4), a chamber (7) for separating gas and liquid, a liquid tank (5), a line (14) and a pump (9). The device comprises also an open gas circuit comprised of an inlet (12), a gas chamber (2) surrounding the venturi fittings (11), these venturi fittings (11), the pipes (4), the separating chamber (7), the tank (5), a line (13) and a de-mister (6). The gas is admitted at atmospheric pressure into the gas chamber (2) and leaves the de-mister (6) being purified by the liquid. |
