| 摘要 |
A material applicator for use with cosmetic materials is constructed of an elongated applicator, a container for the material to be applied by the applicator and a wiper unit. The wiper unit includes a wiping orifice for wiping a material-retaining portion of the applicator as it is withdrawn from the container so as to limit the amount of material retained thereon. A cleaning member is provided which projects inwardly relative to the orifice and penetrates an inner part of the material-retaining portion to aid the removal of material from the inner part.
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