发明名称 Source of charged particles beam
摘要 A source of charged particles beam which can be used either as an electron source or an ion source and has a tip formed of carbide, nitride or di-boride of at least one of elements Ti, Zr, Hf, V, Nb and Ta or formed of hexa-boride of at least one of rare earth metal elements of atomic number 57 to 70.
申请公布号 US4438371(A) 申请公布日期 1984.03.20
申请号 US19820377417 申请日期 1982.05.12
申请人 HITACHI, LTD. 发明人 HOSOKI, SHIGEYUKI;FUTAMOTO, MASAAKI;KAWABE, USHIO;ISHITANI, TOHRU;TAMURA, HIFUMI
分类号 H01J27/26;H01J37/073;H01J37/08;(IPC1-7):H01J7/24 主分类号 H01J27/26
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