发明名称 |
GLOW DISCHARGE CVD DEVICE |
摘要 |
PURPOSE:To high-speedily form a photosensitive layer without generating fine powder by concentrically providing a cylindrical base body into a cylindrical discharge electrode and allowing glow discharge to form and furthermore exerting a magnetic field to cause cyclotron movement for electrons moved between both. CONSTITUTION:A cylindrical base body 100 is concentrically provided into a cylindrical discharge electrode 11 which is arranged in a vacuum vessel 1 and it is heated at prescribed temp. with a heater 7a on a cylinder 7 provided to the inside thereof. Reactive gas contg. silicon atoms is introduced into the vacuum vessel 1. Then glow discharge is allowed to form by impressing high-frequency voltage between the discharge electrode 11 and the base body 100. Thereby the above-mentioned gas is decompossed and a hydrogenated amorphous silicon photosensitive layer is formed on the surface of the base body 100. In the above-mentioned glow discharge CVD device, magnets 21, 22 are provided and cyclotron movement is caused for electrons moved between the discharge electrode 11 and the base body 100 by exerting a magnetic field. Thereby decomposition of gas is efficiently performed under low pressure and the film formation is performed high-speedily without generating fine powder. |
申请公布号 |
JPS6431978(A) |
申请公布日期 |
1989.02.02 |
申请号 |
JP19870187711 |
申请日期 |
1987.07.29 |
申请人 |
FUJITSU LTD |
发明人 |
ARAKI MAKOTO;OSAME HIROSHI;KOBAYASHI KAZUO |
分类号 |
C23C16/50;C23C16/511;G03G5/08;H01L21/205 |
主分类号 |
C23C16/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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