| 摘要 |
PURPOSE:To eliminate the scattering of waterdrop on the edges of a photo mask and on a mask chuck and to make possible a double-side cleaning with no part left uncleaned by a method wherein the title device has opposed two cleaning water jetting nozzles and the photo mask is set on the mask chuck conforming its center to the center of the rotating shaft of the mask chuck between the nozzles. CONSTITUTION:A photo mask 7, which is subjected to position control by mask holding pins 8 on a mask chuck 6 and is set, is rotated on the same rotating shaft as that of the mask chuck by a mask chuck rotating mechanism 12. When cleaning water 14 is jetted on both surfaces of the photo mask from nozzles 9, the cleaning water is jetted only within a nozzle working range 11 at the time of water washing. Whereupon, there is no scattering of waterdrop on the end surfaces of the photo mask and on the mask chuck and the adhesion of a new dirt is eliminated. The upper and lower two nozzles are interlocked and are made to execute the same motion. |
