发明名称 Apparatus for adjusting initial position of melt surface.
摘要 <p>A melt-surface initial position adjusting apparatus which is suitable for use in a monocrystal growing system employing the Czochralski method to adjust the vertical position of the melt surface before the growing of a monocrystal. The apparatus can ensure a highly precise measurement of a crystal-diameter measuring device, thereby enabling a reduction in the costs of producing a monocrystal bar. Before the growing of a crystal, the vertical position (H) of the surface (16A) of a melt within a crucible is measured. The crucible is moved vertically on the basis of the measured value in such a manner as to maintain the distance (L) between the melt surface (16A) and an image sensor (28) for measuring the crystal diameter at a predetermined value.</p>
申请公布号 EP0301998(A1) 申请公布日期 1989.02.01
申请号 EP19880710019 申请日期 1988.07.21
申请人 SHINETSU HANDOTAI KK 发明人 KATSUOKA, NOBUO;HIRANO, YOSHIHIRO;TOMITA, MUNENORI;OZAKI, ATSUSHI
分类号 C30B15/00;C30B15/20;C30B15/26;(IPC1-7):C30B15/26 主分类号 C30B15/00
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