| 摘要 |
PURPOSE:To reduce the swelling property and to improve the resolution of the pattern in a developing and a washing steps by using a specified silicone modified polyvinyl alcohol for the upper layer of a resist having a two layer structure for a pattern formation. CONSTITUTION:The silicone modified polyvinyl alcohol shown by the formula is used for the upper layer having the two layer structure for the pattern formation. In the formula, R1 is alkylene group, R2-R4 are each alkyl group, (m) is an integer of 500-2,000, (n) is an integer of 1-20. For example, the resist having the two layer structure is formed by applying a phenol-novolak type resin on a silicone substrate forming a circuit wiring to form a smoothened layer of the resist having the two layer structure, and then, by applying a resist solution obtd. by filtering a cyclohexanone solution contg. 13wt.% the silicone modified polyvinyl alcohol, on said smoothened layer, followed by baking it. Thus, the upper layer of the resist having the two layer structure which has the excellent sensitivity, resolution and anti-oxygen plasma property can be obtd. |
