发明名称 |
Resist coating apparatus |
摘要 |
A liquid state resist is dropped to form a coating on a semiconductor substrate mounted on a rotary chuck disposed in a resist coating vessel in which a sealed solvent vapor atmosphere is created. An adjusting plate is provided in the coating vessel above the rotary chuck in a stationary or movable manner to weaken or substantially reduce a swirly flow of the solvent vapor which tends to occur in the coating vessel when the chuck is rotated. Thus a substrate coated with a resist film of uniform thickness is obtained.
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申请公布号 |
US4800836(A) |
申请公布日期 |
1989.01.31 |
申请号 |
US19880172497 |
申请日期 |
1988.03.24 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
YAMAMOTO, NOBORU;MATSUOKA, YASUO |
分类号 |
G03F7/16;(IPC1-7):B05C13/00;B05C15/00 |
主分类号 |
G03F7/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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