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发明名称
ELECTRON BEAM EXPOSURE SYSTEM
摘要
申请公布号
JPS6425414(A)
申请公布日期
1989.01.27
申请号
JP19870181962
申请日期
1987.07.21
申请人
FUJITSU LTD
发明人
ARII KATSUYUKI;YASUDA HIROSHI
分类号
H01L21/027;G03F7/20;H01L21/30
主分类号
H01L21/027
代理机构
代理人
主权项
地址
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