发明名称 A PROCESS OF FORMING SILICA GLASS
摘要 <p>PCT No. PCT/JP83/00450 Sec. 371 Date Aug. 20, 1984 Sec. 102(e) Date Aug. 20, 1984 PCT Filed Dec. 22, 1983 PCT Pub. No. WO84/02519 PCT Pub. Date Jul. 5, 1984.A process for forming monolithic silica glass articles is provided. The process includes the steps of hydrolyzing silicon alkoxide to form a hydrolyzed solution, adding fumed silica to the hydrolyzed silicon alkoxide solution to yield a sol solution, gelling the sol solution to a gel, and drying and sintering the gel to obtain the monolithic silica glass articles.</p>
申请公布号 SG39588(G) 申请公布日期 1989.01.27
申请号 SG19880000395 申请日期 1988.06.20
申请人 SEIKO EPSON CORPORATION 发明人
分类号 C03B8/02;C03B19/12;C03C1/00;C03C3/06;(IPC1-7):C03C1/02;C03B20/00 主分类号 C03B8/02
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