| 摘要 |
PURPOSE:To efficiently obtain a corrected mask pattern by composing a mask pattern input editor of electron beam exposing mask pattern input editing means used for manufacturing a VLSI, calculating means for energy distribution of electrons irradiated through the pattern, lost in a resist, and display means therefor. CONSTITUTION:A mask pattern input editor 1 inputs new input of position information of a mask pattern, new position information for input mask pattern, corrects and stores position information of the mask pattern information. An energy distribution calculator 2 calculates energy distribution stored in a resist from the trace of incident electrons by a Monte-Carlo method on the basis of mask information input and edited in the editor 1. A display unit 3 simultaneously displays the pattern edited by the editor 1 and the calculated result obtained by the calculator 2. Thus, a proximity effect in the fine mask pattern is suitably corrected while predicting it in advance. |
