| 发明名称 |
Combined ion and molecular beam apparatus and method for depositing materials |
| 摘要 |
A method and apparatus is described for combined deposition of thin films of materials from an ion beam source and a molecular beam source in a single reactor.
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| 申请公布号 |
US4800100(A) |
申请公布日期 |
1989.01.24 |
| 申请号 |
US19870113740 |
申请日期 |
1987.10.27 |
| 申请人 |
MASSACHUSETTS INSTITUTE OF TECHNOLOGY |
发明人 |
HERBOTS, NICOLE;HELLMAN, OLOF C. |
| 分类号 |
C23C14/22;C23C14/24;C30B23/02;(IPC1-7):B05D3/06 |
主分类号 |
C23C14/22 |
| 代理机构 |
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