Method of forming a thin film by chemical vapor deposition,申请号US19870074579-传众专利搜索

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发明名称	Method of forming a thin film by chemical vapor deposition
摘要
申请公布号	US4800105(A)	申请公布日期	1989.01.24
申请号	US19870074579	申请日期	1987.07.17
申请人	NIHON SHINKU GIJUTSU KABUSHIKI KAISHA	发明人	NAKAYAMA, IZUMI;SUZUKI, AKITOSHI;KUSUMOTO, YOSHIRO;TAKAKUWA, KAZUO;IKUTA, TETSUYA
分类号	C23C16/44;C23C16/455;C23C16/48;(IPC1-7):C23C16/08;C23C16/30	主分类号	C23C16/44
代理机构		代理人
主权项
地址

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