发明名称 REDUCTION PROJECTION ALIGNER
摘要 PURPOSE:To make a size of a pattern uniform inside a region to be exposed by changing and adjusting a radius of curvature of a condensing lens. CONSTITUTION:A light-transmitting liquid 6 is filled into a hermetically sealed space S formed by elastic films 1a; a pressure of this fluid acts on the films 1a; the films 1a are inflated like an arc; a degree of curvature of the arc-like films 1a is adjusted; a radius of curvature of a condensing lens 1 composed of the two films 1a, 1a is changed. If the radius of curvature of the condensing lens 1 is changed, a condensing degree of light is changed; the intensity of illumination of a whole region inside an area to be exposed can be made uniform. By this setup, an amount of light to be exposed inside the area to be exposed can be made uniform; a uniformly exposed pattern can be obtained.
申请公布号 JPS6418222(A) 申请公布日期 1989.01.23
申请号 JP19870175639 申请日期 1987.07.14
申请人 NEC KYUSHU LTD 发明人 HAYASHI YUJI
分类号 H01L21/30;G03F7/20;G03F9/00;H01L21/027 主分类号 H01L21/30
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