发明名称 POSITIVE TYPE PHOTORESIST COMPOSITION
摘要 PURPOSE:To improve the stability of application ability, the sensitivity, the film retention ratio and the resolution of the titled composition by incorporating a 1,2-naphthoquinone diazide sulfonate of 2,3,4-trihydroxy-2'-methyl benzophenone as a guinone diazide type photosensitive component. CONSTITUTION:The titled composition comprises the 1,2-naphthoquinone diazide sulfonate of 2,3,4-trihydroxy-2'-methyl benzophenone as the quinone diazide type photosensitive component. The trihydroxy benzophenone is necessary to have a methyl group at 2'-position thereof, and said 2,3,4-trihydroxy benzophenone having the methyl group at 3' or 4' position is useless. And, the quinone diazide type photosensitive component is preferably used as a solution by dissolving said component together with an alkaline soluble resin in a suitable solvent. Additionally, the titled composition may compound an additive such as a surfactant, a dyestuff, a stabilizer and a sensitizer, etc. Thus, the stability of application ability, the sensitivity, the film retention ratio and the resolution of the titled composition are improved.
申请公布号 JPS6417049(A) 申请公布日期 1989.01.20
申请号 JP19870172596 申请日期 1987.07.10
申请人 TOYO GOSEI KOGYO KK 发明人 URANO HIROKO;SUGIURA HITOSHI;KIKUCHI HIDEO;YAMAZAWA YOJI
分类号 G03C1/72;G03F7/022;H01L21/027 主分类号 G03C1/72
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