发明名称 PATTERN FORMING MATERIAL
摘要 PURPOSE:To obtain the excellent sensitivity, and to always obtain the high resolution of the titled material without injuring anti-oxygen plasma property, by incorporating a surfactant in the silicone resin in an amount of depressing surface tension, and said resin has a vinyl group in a side chain, a silyl- terminated and also has a ladder structure. CONSTITUTION:The usable silicone resin having the ladder structure is exemplified preferably by silylized polyvinyl silsesquioxane, etc., and the surfactant is added to the silicone resin having the ladder structure in the amount sufficient to depress the surface tension of the resist at the time of preparing a resist solution. The preferable additional amount of the surfactant is arrange of several hundred - several thousand ppm based on the resin. Thus, at the time of forming a resist pattern, the excellent sensitivity and the improved resolution of the titled material, without injuring the anti-oxygen plasma are obtd.
申请公布号 JPS6418141(A) 申请公布日期 1989.01.20
申请号 JP19870173859 申请日期 1987.07.14
申请人 FUJITSU LTD 发明人 WATABE KEIJI;SAITO KAZUMASA;FUKUYAMA SHUNICHI;SHIBA SHOJI;KAWASAKI YOKO;YONEDA YASUHIRO
分类号 G03C1/00;G03F7/004;G03F7/075 主分类号 G03C1/00
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