| 摘要 |
PURPOSE:To obtain single-layer or multi-layer films in an excellent productivity by fitting a supporting plate of a special base plate having an internal diameter and a thickness not smaller than those of a base plate and provided with a plurality of cylindrical air gaps to a vertical axis revolving tray and revolving it in a sputtering chamber to conduct sputtering. CONSTITUTION:A plurality of air gaps 4, 1 having an internal diameter and a thickness not small than the base plate 5 is fitted in supporting plates 3, 9 of the base plate and center masking caps 6, 14 holding transparent plastic base plates 5, 11 are fitted in the center of the base plate 13 mounted out of the enter 12 of the air gap. Then, said holding plates 3, 9 are fitted to the vertical axis revolving tray 2 provided with a space part 7 on the rear parts of the base plates 5, 11 in the sputtering chamber 1, the tray 2 is turned in an arrow A direction to revolve the base plates 5, 11 and rotate it in the air gaps 4, 10 in an arrow B direction. After the internal part of a sputtering chamber 1 is made highly vacuous, Ar, N2, etc., for example, are introduced to provide a prescribed film by the reactive RE magnetron sputtering method through a target 8 on the base plates 5, 11. |
