| 摘要 |
An improved process is provided for the preparation of the dimer, 2,2-paracyclophane, which is useful as the starting material for parylene conformal coatings used in the electronics industry for the protection of various sensitive electronic components. The process comprises optimization of the normally low yield of dimer formed by the Hofmann elimination reaction of p-methylbenzyltrimethylammonium hydroxide by conducting the elimination reaction in the presence of a cosolvent and certain reaction promoters. |
