发明名称
摘要 PURPOSE:To prevent the deposition of the solid raw material flowing in an inside pipe so as to provide adequate workability and mass productivity by forming a reactive gas introducing pipe to be provided to the gas introducing flange of a reaction chamber into a mutliple-layered construction and passing fluid of a high-temp. through an outside pipe. CONSTITUTION:The solid raw material introducing part of the gas inroducing flange 11 connecting and closing hermetically the open/shut door 16 of the reaction chamber 3 and the chamber 3 is made into the multi-layered construction consisting of the inside pipe 18, middle pipe 19 and inside pipe 20 (the middle pipe 19 is excluded in some case). Gas or liquid is passed through a liquid supply pipe 21 and is heated by a heater 22. The heated gas or fluid is supplied as high- temp. fluid between the pipe 18 and the pipe 19 to heat uniformly the pipe 18. The fluid is discharged from a discharge pipe 23. The pipe 18 in which the gas contg. the solid raw material vapor has no parts to contect directly with the gas introducing flange and has the decreased heat conductivity. Since the heat is always supplied to the pipe 18, the pipe is free from local cooling. The deposition of the solid raw material in the introducing part is prevented and the uniform CVD film is formed with good reproducibility.
申请公布号 JPS642668(B2) 申请公布日期 1989.01.18
申请号 JP19840136610 申请日期 1984.07.03
申请人 KOKUSAI DENKI KK 发明人 SHIBATA EIJI
分类号 C23C16/44;C23C16/00;C23C16/455;H01L21/205;H01L21/285 主分类号 C23C16/44
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