| 发明名称 |
X-ray lithography system. |
| 摘要 |
<p>An X-ray lithography system comprises an X-ray source which forms a plasma, a band slit located between the X-ray source and a resist film such that a short slit side is parallel with a central axis of a plasma column, the long slit side being tilted with respect to said central plasma column axis.</p> |
| 申请公布号 |
EP0299576(A2) |
申请公布日期 |
1989.01.18 |
| 申请号 |
EP19880201456 |
申请日期 |
1988.07.08 |
| 申请人 |
HITACHI, LTD.;N.V. PHILIPS' GLOEILAMPENFABRIEKEN |
发明人 |
STORMBERG, HANS-PETER;WATANABE, YOSHIO |
| 分类号 |
G03F7/20;G21K5/02;H01L21/027 |
主分类号 |
G03F7/20 |
| 代理机构 |
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代理人 |
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| 地址 |
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