| 摘要 |
PURPOSE:To precisely transfer a desirable pattern by using the same holder as one used when patterning is executed to a photomask itself at the time of transferring or correcting a mask pattern at the time of forming the photomask according to stain caused by the holder at the time of patterning. CONSTITUTION:In case of transferring the photomask having the mask pattern to which the patterning is executed on a body to be transferred, the holder which is the same as the holder 11 used when patterning is executed to the photomask 81 itself is used at the time of transferring or the mask pattern is corrected at the time of forming the photomask according to the stain caused by the holder 11 at the time of patterning. Since the quantity of stain is transferred, as it is, when peculiar stain caused at the time of forming the photomask is transferred on a semiconductor wafer the stain in case of patterning is canceled and precise patterning is made possible. |
