| 摘要 |
PURPOSE:To perform a stable plasma position shape control by performing feedback control of plasma current/position shape control system and by setting a coefficient which may make the feedback control to be a positive feedback characteristics to 0 when the plasma position shape changes. CONSTITUTION:Plasma current/position shape control system consists of adders 4 and 5, a coil current command value calculation circuit 6, a coil current control circuit 7, and a hybrid coil system 1. The circuit 7 outputs coil current control signal (g) and control power supplies B1, B2,... and B16 of system 1 controls coils C1-C16 and generate a synthesized magnetic field Bm to stably control the position shape of plasma 3 in plasma system 2. The circuit 6 sets a coefficient which may make the feedback control to be a positive feedback characteristics to 0 when the plasma position shape changes. This allows a stable plasma position shape control to be performed. |
