发明名称 |
Semiconductor device having a floating gate. |
摘要 |
<p>In a semiconductor device having a floating gate electrode (16), an electric field to be applied to a gate oxide film (14) is locally modulated in a region where the floating gate electrode (16) overlaps a drain or source region (21). The device of the present invention is well suited for application as a nonvolatile memory cell, and it exhibits a slight leakage current in an erase operation and has a high immunity against the drain disturb phenomenon.</p> |
申请公布号 |
EP0298430(A2) |
申请公布日期 |
1989.01.11 |
申请号 |
EP19880110725 |
申请日期 |
1988.07.05 |
申请人 |
HITACHI, LTD. |
发明人 |
KUME, HITOSHI;YAMAMOTO, HIDEAKI;TSUKADA, TOSHIHISA;KAMIGAKI, YOSHIAKI;ADACHI, TETSUO;KURE, TOKUO |
分类号 |
H01L29/786;H01L29/788 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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