发明名称 Semiconductor device having a floating gate.
摘要 <p>In a semiconductor device having a floating gate electrode (16), an electric field to be applied to a gate oxide film (14) is locally modulated in a region where the floating gate electrode (16) overlaps a drain or source region (21). The device of the present invention is well suited for application as a nonvolatile memory cell, and it exhibits a slight leakage current in an erase operation and has a high immunity against the drain disturb phenomenon.</p>
申请公布号 EP0298430(A2) 申请公布日期 1989.01.11
申请号 EP19880110725 申请日期 1988.07.05
申请人 HITACHI, LTD. 发明人 KUME, HITOSHI;YAMAMOTO, HIDEAKI;TSUKADA, TOSHIHISA;KAMIGAKI, YOSHIAKI;ADACHI, TETSUO;KURE, TOKUO
分类号 H01L29/786;H01L29/788 主分类号 H01L29/786
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