| 摘要 |
PURPOSE:To prevent the generation of a wafer slip line by a method wherein ring-like lamps are concentrically formed, and ring-shaped reflecting mirrors, which reflect and forcus the light sent from the ring-shaped lamps arranged corresponding to the end part of the outer circumference of a wafer, and it is made to irradiate on the outer circumferential end part, are provided. CONSTITUTION:Ring-shaped lamps 5 are concentrically arranged on a wafer 2 through quartz tubes 1. Among the ring-shaped lamps 5, a pair of the ring- shaped lamps 5a on the outermost side are excluded, and on the remaining ring-shaped lamps 5b, ring-shaped reflecting mirrors 6 are arranged. The ring- shaped lamps 5a on the outermost side on the upper and the lower sides are arranged on one forcus position of a pair of ring-shaped reflecting mirrors 7 having the reflection cross-section of oval arc shape. The light sent from the ring-shaped lamps 5b is formed into a parallel light by the ring-shaped reflecting mirrors 6, it is made to irradiate uniformly form both sides of the wafer 2. The light sent from the ring-shaped lamps 5a is formed into a focussed light by the ring-shaped reflection mirrors 7, and it is made to irradiate obliquely on the outer circumferential end part of the wafer 2. As a result, the temperature on the planar surface of the wafer 2 can be made uniform. |
