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发明名称
CHARGED PARTICLE BEAM LITHOGRAPHY SYSTEM
摘要
申请公布号
EP0220668(A3)
申请公布日期
1989.01.11
申请号
EP19860114612
申请日期
1986.10.22
申请人
HITACHI, LTD.
发明人
SAITOU, NORIO;OKUMURA, MASAHIDE;KOMODA, TSUTOMU;OOYAMA, MITSUO
分类号
H01J37/305;H01J37/317;H01L21/027;(IPC1-7):H01J37/317;H01J37/302
主分类号
H01J37/305
代理机构
代理人
主权项
地址
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