| 摘要 |
PURPOSE:To enhance sensitivity without impairing a residual film rate by incorporating at least one of naphthols in the photoresist composition. CONSTITUTION:The photoresist composition of the title contains a novolak resin (A), a quinonediazide compound as a photosensitive agent, and the naphthol (B), such as alpha- or beta-naphthol, usable alone or in a combination of them. The resin (A) is obtained by additionally condensing cresols with formaldehyde, and its molecular weight distribution is as follows; a fraction of 150-500 amounts to 8-35%, that of 500-5,000 amounts to 0-25%, and that of >=5,000 amounts to 40-92%, and these molecular weights are obtained by the areal ratio of the gel permeation chromatographic pattern and expressed in terms of polystyrene. |
